A new and very promising X-ray diffraction method for the texture and
internal stress investigation is described, This method, based on the
conventional pole figure measurements in the back-reflection technique
, affords possibilities for investigations of the diffraction effects
due to layers on a given depth in a material. The condition of constan
t information depth is attained by abandoning the Bragg-Brentano local
ization geometry, using an appropriate offset angle for each sample ti
lt angle. During such measurement, after selection of the adequate off
set angle, its corresponding change proceeds automatically. In order t
o obtain satisfactory integrated intensities, a pseudo-position sensit
ive detection technique is applied. The proposed method in this non-sy
mmetrical mode is both a recommendable and useful tool for studying te
xtured and epitaxial thin films as well as multi-layer systems. (C) 19
98 Published by Elsevier Science S.A.