EPITAXIAL-GROWTH OF YBA2CU3O7-X THIN-FILMS ON (111)SRTIO3 SUBSTRATES

Citation
E. Brecht et al., EPITAXIAL-GROWTH OF YBA2CU3O7-X THIN-FILMS ON (111)SRTIO3 SUBSTRATES, Thin solid films, 319(1-2), 1998, pp. 202-206
Citations number
7
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
319
Issue
1-2
Year of publication
1998
Pages
202 - 206
Database
ISI
SICI code
0040-6090(1998)319:1-2<202:EOYTO(>2.0.ZU;2-5
Abstract
The growth of YBa2Cu3O7-x thin films deposited by sputtering onto (111 ) SrTiO3 substrates at different temperatures, T-s, was studied by X-r ay diffraction and HRTEM measurements. At all T-s values, the films gr ow epitaxially (113) oriented. Ar low T-s, the growth is pseudomorphic and homogeneously strained. At high T-s, strain is released probably by defect incorporation leading to broad mosaic distributions. In the intermediate T-s range, internal strain is accumulated in the films. T hree domain orientations tilted by 120 degrees were observed in the fi lm plane. Superconductivity with maximum T-c values of 84 K was only o bserved in films prepared at high T-s revealing the orthorhombic struc ture. The oxygenation of the films is probably strain-controlled. (C) 1998 Elsevier Science S.A.