MAGNETORESISTANCE OF IMPLANTED POLYPARAPH ENYLENE FILMS IN THE LOW-TEMPERATURE RANGE

Authors
BELLATI A MOLITON A LUCAS B GUILLE B FRANCOIS B
Citation
A. Bellati et al., MAGNETORESISTANCE OF IMPLANTED POLYPARAPH ENYLENE FILMS IN THE LOW-TEMPERATURE RANGE, Journal de chimie physique et de physico-chimie biologique, 95(6), 1998, pp. 1449-1452
Citations number
7
Categorie Soggetti
Biology,"Chemistry Physical
Journal title
Journal de chimie physique et de physico-chimie biologique → ACNP
Volume
95
Issue
6
Year of publication
1998
Pages
1449 - 1452
Database
ISI
SICI code
Abstract
The magnetoresistance of implanted polyparaphenylene films (E= 30 keV, 10(15) ions/cm(2) < D < 5x10(16) ions/cm(2)) is negative in the low t emperature range, whereas its sign is positive for higher temperature when the fluence is sufficiently low; the negative component is attrib uted to localized states which appear during implantation with high fl uence.