For the first time we have observed quantized conductance in a split g
ate quantum point contact prepared in a strained In0.77Ga0.23As/InP tw
o-dimensional electron gas (2DEG). Although quantization effects in ga
ted two-dimensional semiconductor structures are theoretically well kn
own and proven in various experiments on AlGaAs/GaAs and also on In0.0
4Ga0.96As/GaAs, no quantum point contact has been presented in the InG
aAs/InP material with an indium fraction as high as 77% so far. The ma
jor problem is the comparatively low Schottky barrier of the InGaAs (p
hi(B) x 0.2 eV) making leakage-free gate structures difficult to obtai
n. Nevertheless this heterostructure-especially with the highest possi
ble indium content-has remarkable properties concerning quantum interf
erence devices and semiconductor/superconductor hybrid devices because
of its large phase coherence length and the small depletion zone, res
pectively. In order to produce leakage-free split gate point contacts
the samples were covered with an insulating SiO2 layer prior to metal
deposition. The gate geometry was defined by electron-beam lithography
. In this paper we present first measurements of a point contact on an
In0.77Ga0.23As/InP 2DEG clearly showing quantized conductance. (C) 19
98 Academic Press Limited.