ELECTROLYTIC DEPOSITION OF NIOBIUM OXIDE-FILMS

Authors
Citation
I. Zhitomirsky, ELECTROLYTIC DEPOSITION OF NIOBIUM OXIDE-FILMS, Materials letters, 35(3-4), 1998, pp. 188-193
Citations number
43
Categorie Soggetti
Material Science","Physics, Applied
Journal title
ISSN journal
0167577X
Volume
35
Issue
3-4
Year of publication
1998
Pages
188 - 193
Database
ISI
SICI code
0167-577X(1998)35:3-4<188:EDONO>2.0.ZU;2-5
Abstract
Cathodic electrolytic deposition of Nb2O5 films on platinum substrates was performed via hydrolysis by use of an electrogenerated base of th e NbCl5 salt dissolved in water in the presence of hydrogen peroxide. The deposits were characterized by XRD, TG/DTA, SEM and Auger methods. The crystallization behavior of the deposits and precipitated gels wa s compared. A possible mechanism of electrodeposition is discussed. (C ) 1998 Elsevier Science B.V. All rights reserved.