INVESTIGATION OF THE ENERGETIC DEPOSITION OF AU (001) THIN-FILMS BY MOLECULAR-DYNAMICS SIMULATION

A molecular-dynamics simulation of Au (0 0 1) thin film growth with en ergetic atoms was carried out. The incident-atom energies were selecte d as 10.0, 1.0, and 0.1 eV and two kinds of substrate temperatures, 30 0 and 100 K, were selected to study the effect of substrate temperatur e on film growth. Three kinds of film growth mode, layer-by-layer grow th, layer-by-layer growth followed by 3-dimensional island formation, and 3-dimensional island growth, were observed at the condition of 300 K and higher than 1.0 eV incident-atom energy, 300 K and 0.1 eV incid ent-atom energy, and 100 K and 0.1 eV incident-atom energy, respective ly. The surface coverage, diffracted intensity, morphology, and interf ace mixing of Au (0 0 1) film deposited with different incident-atom e nergy and the atom transport were described. The effects of incident-a tom energy and substrate temperature on the film growth were also disc ussed in the article. (C) 1998 Elsevier Science B.V.