CHARACTERIZATION OF HIGH-NITROGEN CONTENT CARBON NITRIDE THIN-FILMS BY RBS AND INFRARED TECHNIQUES

Citation
Jm. Mendez et al., CHARACTERIZATION OF HIGH-NITROGEN CONTENT CARBON NITRIDE THIN-FILMS BY RBS AND INFRARED TECHNIQUES, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 138, 1998, pp. 231-235
Citations number
15
Categorie Soggetti
Instument & Instrumentation","Nuclear Sciences & Tecnology","Physics, Atomic, Molecular & Chemical","Physics, Nuclear
ISSN journal
0168583X
Volume
138
Year of publication
1998
Pages
231 - 235
Database
ISI
SICI code
0168-583X(1998)138:<231:COHCCN>2.0.ZU;2-E
Abstract
Carbon nitride compounds have attracted much interest due to the predi cted superior properties of C3N4. Carbon nitride thin films have been produced by reactive DC magnetron sputtering and rf PECVD. Of paramoun t importance to study the growth of CN films is the accurate determina tion of their composition in order to evaluate whether an ideal phase call be obtained. The film composition and density were obtained using 1.94 MeV He-4(+) RBS. The films have been also characterized by FTIR spectroscopy, profilometry and ellipsometry. (C) 1998 Published by Els evier Science B.V.