ANALYSIS OF A-BXCY-H-Z COATINGS WITH IBA TECHNIQUES

Amorphous hydrogenated boron carbide thin films were analyzed using th e (alpha, p) reaction on boron, (alpha, alpha) backscattering on carbo n and the (N-15, alpha gamma) resonant reaction on hydrogen as part of an investigation of superhard coatings. The films were deposited on a luminium-silicon-magnesium substrates by Physical Vapor Deposition (PV D)-Magnetron Sputtering in an argon gas atmosphere with the admixture of methane (CH4) gas using B4C as starting material. The elemental com position was determined by the concentration ratio of boron and carbon , obtained from the simultaneously recorded boron and carbon spectra, and the separately measured hydrogen profile, An important finding was the irradiation stability, the homogeneous depth distribution and the high uptake of hydrogen which open up the possibility for the product ion of a new hydrogen standard. (C) 1998 Elsevier Science B.V.