DYNAMIC IN-SITU DIAGNOSTICS USING HIGH-ENERGY ION-BEAM ANALYSIS

MeV ion beam analysis (IBA) is presented as a powerful tool for in sit u, real-time process diagnostics. With minor additional experimental e quipment such as differential pumping or the installation of special d etectors, dynamic stoichiometric profiles can be measured during ion b eam or plasma exposure. Spectrum acquisition times of the order of a f ew minutes or less enable the study of fast and transient diffusion ef fects and transient surface coverages. Examples are given addressing t he diffusion and trapping of hydrogen in nickel around room temperatur e, the ion beam synthesis of carbon-nitrogen films, the ion beam nitri ding of stainless steel, and the diagnostics of the layered structure of cubic boron nitride films. The latter example combines stoichiometr ic in situ analysis using dynamic ERD and structural in situ analysis using optical ellipsometry. (C) 1998 Elsevier Science B.V.