OPTICAL-CONSTANTS OF IN SITU-DEPOSITED FILMS OF IMPORTANT EXTREME-ULTRAVIOLET MULTILAYER MIRROR MATERIALS

Authors
TARRIO C WATTS RN LUCATORTO TB SLAUGHTER JM FALCO CM
Citation
C. Tarrio et al., OPTICAL-CONSTANTS OF IN SITU-DEPOSITED FILMS OF IMPORTANT EXTREME-ULTRAVIOLET MULTILAYER MIRROR MATERIALS, Applied optics, 37(19), 1998, pp. 4100-4104
Citations number
13
Categorie Soggetti
Optics
Journal title
Applied optics → ACNP
ISSN journal
00036935
Volume
37
Issue
19
Year of publication
1998
Pages
4100 - 4104
Database
ISI
SICI code
0003-6935(1998)37:19<4100:OOISFO>2.0.ZU;2-H
Abstract
We have performed angle-dependent reflectance measurements of in situ magnetron sputtered films of B4C, C, Mo, Si, and W. The Fresnel relati ons were used to determine the complex index of refraction from the re flectance data in the region of approximately 35-150 eV. In the cases of Si, C, and B4C we found excellent agreement with published data. Ho wever, for Mo and W we found that the optical properties from 35 to 60 eV differed significantly from those in the Literature.