ELECTROCHEMICAL EVALUATION OF THIN-FILMS AND COATINGS DEPOSITED WITH ION-BEAM-ASSISTED DEPOSITION (IBAD) USING SCANNING ELECTROCHEMICAL MICROELECTRODES (VOL 2, PG 66, 1998)

Authors
VERA E STIPPICH F MEINERT K WOLF GK
Citation
E. Vera et al., ELECTROCHEMICAL EVALUATION OF THIN-FILMS AND COATINGS DEPOSITED WITH ION-BEAM-ASSISTED DEPOSITION (IBAD) USING SCANNING ELECTROCHEMICAL MICROELECTRODES (VOL 2, PG 66, 1998), Materialwissenschaft und Werkstofftechnik, 29(6), 1998, pp. 1-1
Citations number
1
Categorie Soggetti
Material Science
Journal title
Materialwissenschaft und Werkstofftechnik → ACNP
ISSN journal
09335137
Volume
29
Issue
6
Year of publication
1998
Pages
1 - 1
Database
ISI
SICI code
0933-5137(1998)29:6<1:EEOTAC>2.0.ZU;2-V