A NEW UNIVERSAL METHOD OF MONITORING LAYER PARAMETERS AND SURFACE-ROUGHNESS IN VACUUM DEPOSITION AND ETCHING PROCESSES

Citation
Am. Baranov et al., A NEW UNIVERSAL METHOD OF MONITORING LAYER PARAMETERS AND SURFACE-ROUGHNESS IN VACUUM DEPOSITION AND ETCHING PROCESSES, Technical physics, 42(8), 1997, pp. 910-912
Citations number
8
Journal title
ISSN journal
10637842
Volume
42
Issue
8
Year of publication
1997
Pages
910 - 912
Database
ISI
SICI code
1063-7842(1997)42:8<910:ANUMOM>2.0.ZU;2-J