SCANNING-TUNNELING-MICROSCOPY STUDY OF THE INITIAL REACTION OF SIH2CL2 MOLECULES WITH THE SI(111)-7X7 SURFACE

Authors
KOMURA T OKANO S MORIKAWA K HANADA T YOSHIMURA M YAO T
Citation
T. Komura et al., SCANNING-TUNNELING-MICROSCOPY STUDY OF THE INITIAL REACTION OF SIH2CL2 MOLECULES WITH THE SI(111)-7X7 SURFACE, Applied surface science, 132, 1998, pp. 23-28
Citations number
13
Categorie Soggetti
Physics, Applied","Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
132
Year of publication
1998
Pages
23 - 28
Database
ISI
SICI code
0169-4332(1998)132:<23:SSOTIR>2.0.ZU;2-W
Abstract
The initial stage of the reaction of dichlorosilane (SiH2Cl2) with the Si(111)-(7 X 7) surface under exposure below 1 L is investigated usin g a scanning tunneling microscope (STM). We found that corner adatoms are preferentially reacted over the center adatoms at the very beginni ng of exposure. The initial reaction process of SiH2Cl2 with Si(111)-( 7 x 7) surface is discussed. It is suggested that the preferential rea ctivity of a corner-hole atom is reduced as the exposure increases, wh ich may give rise to reacted rest atoms. (C) 1998 Elsevier Science B.V . All rights reserved.