COMPETITION BETWEEN TERRACE AND STEP NUCLEATION - EPITAXY OF CAF2 ON VICINAL SI(111) STUDIED BY ATOMIC-FORCE MICROSCOPY

Citation
J. Wollschlager et al., COMPETITION BETWEEN TERRACE AND STEP NUCLEATION - EPITAXY OF CAF2 ON VICINAL SI(111) STUDIED BY ATOMIC-FORCE MICROSCOPY, Applied surface science, 132, 1998, pp. 29-35
Citations number
15
Categorie Soggetti
Physics, Applied","Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
132
Year of publication
1998
Pages
29 - 35
Database
ISI
SICI code
0169-4332(1998)132:<29:CBTASN>2.0.ZU;2-#
Abstract
The morphology of CaF2 adlayers deposited on vicinal Si(1 1 1) substra tes has been studied by atomic force microscopy (AFM) for low and high deposition temperatures. In the low temperature regime the adlayer gr ows in the layer-by-layer growth mode preserving the vicinal step stru cture of the substrate. The diffusion energy of 1.5 eV for CaF2 molecu les on CaF2 terraces is obtained from the transition from terrace to s tep nucleation. In the high temperature regime the adlayer morphology is very inhomogeneous since the adlayer grows in the Stranski-Krastano v growth mode. Here the CaF2 growing on a closed CaF interface layer d oes not cover all terraces. This morphology is attributed to the heter ogeneous nucleation of islands at steps and to the formation of additi onal triangular protrusions. (C) 1998 Elsevier Science B.V. All rights reserved.