FORMATION OF AN ORDERED SURFACE COMPOUND CONSISTING OF AG, SI, AND H ON SI(001)

Citation
A. Nagashima et al., FORMATION OF AN ORDERED SURFACE COMPOUND CONSISTING OF AG, SI, AND H ON SI(001), Applied surface science, 132, 1998, pp. 248-253
Citations number
15
Categorie Soggetti
Physics, Applied","Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
132
Year of publication
1998
Pages
248 - 253
Database
ISI
SICI code
0169-4332(1998)132:<248:FOAOSC>2.0.ZU;2-6
Abstract
With scanning tunneling microscopy and low energy electron diffraction , we have studied formation of a surface compound with Ag, Si and H on Si(001). In contrast to the case of Si(111)-(root 3 x root 3)Ag, on w hich adsorption of H atoms brings no homogeneous phases, moderate H ad sorption on Si(001)-(2 X 3) Ag produces a uniform compound phase with a 2 X 2 structure that lacks mirror symmetry in the [1 (1) over bar 0] direction. Further H adsorption causes agglomeration of surface atoms while the flat area of the surface becomes dominated by another asymm etric 2 X 2 structure. (C) 1998 Elsevier Science B.V. All rights reser ved.