M. Iizuka et al., FABRICATION AND CHARACTERIZATION OF FIELD-EFFECT TRANSISTORS USING DONOR AND ACCEPTOR STACKED LAYERS, Applied surface science, 132, 1998, pp. 914-918
Citations number
13
Categorie Soggetti
Physics, Applied","Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
We fabricated field-effect transistors (FETs) using donor (TMTSF) and
acceptor (TCNQ) stacked layers, and we investigated the change of cond
uctivity in the charge transfer (CT) complex layer by applying gate vo
ltages. Two types of FETs having TMTSF/TCNQ and TCNQ/TMTSF structures
are examined. The stacked-layer FET shows a large transconductance com
pared with a single-layer FET. The experimental results demonstrate th
at the CT complex layer formed between donor and acceptor films mainly
works as a conduction channel. Furthermore, the change in the degree
of charge transfer (corresponding to conductivity change) is confirmed
by infrared absorption spectra. (C) 1998 Elsevier Science B.V. All ri
ghts reserved.