BEHAVIOR OF THE GLASS-TRANSITION AND CRYSTALLIZATION TEMPERATURES OF THE OXIDE GLASS MGO-AL2O3-SIO2 UNDER EXTERNAL INFLUENCES

Citation
Vi. Alekseenko et al., BEHAVIOR OF THE GLASS-TRANSITION AND CRYSTALLIZATION TEMPERATURES OF THE OXIDE GLASS MGO-AL2O3-SIO2 UNDER EXTERNAL INFLUENCES, Technical physics, 42(10), 1997, pp. 1141-1144
Citations number
7
Journal title
ISSN journal
10637842
Volume
42
Issue
10
Year of publication
1997
Pages
1141 - 1144
Database
ISI
SICI code
1063-7842(1997)42:10<1141:BOTGAC>2.0.ZU;2-4
Abstract
The kinetics of the glass transition T-g and crystallization T-cr temp eratures of the glass MgO-Al2O3-SiO2 is studied under conditions of an nealing in the glass transition interval and after treatment with a pu lsed magnetic held (PMF). It is found that all the parameters studied exhibit nonmonotonic and intercorrelated variations in time. These tem poral variations are due to structural relaxation (SR) in the glass. I t is observed that a relative decrease of T-g and T-cr occurs in the a nnealed or PMF-treated glass. This effect is important from the standp oint of modern ideas about the mechanisms of structural relaxation and is due to the concentrational redistribution of chemical bonds. The c ondition for externally induced anomalous behavior of the temperatures investigated is determined. (C) 1997 American Institute of Physics.