Vi. Alekseenko et al., BEHAVIOR OF THE GLASS-TRANSITION AND CRYSTALLIZATION TEMPERATURES OF THE OXIDE GLASS MGO-AL2O3-SIO2 UNDER EXTERNAL INFLUENCES, Technical physics, 42(10), 1997, pp. 1141-1144
The kinetics of the glass transition T-g and crystallization T-cr temp
eratures of the glass MgO-Al2O3-SiO2 is studied under conditions of an
nealing in the glass transition interval and after treatment with a pu
lsed magnetic held (PMF). It is found that all the parameters studied
exhibit nonmonotonic and intercorrelated variations in time. These tem
poral variations are due to structural relaxation (SR) in the glass. I
t is observed that a relative decrease of T-g and T-cr occurs in the a
nnealed or PMF-treated glass. This effect is important from the standp
oint of modern ideas about the mechanisms of structural relaxation and
is due to the concentrational redistribution of chemical bonds. The c
ondition for externally induced anomalous behavior of the temperatures
investigated is determined. (C) 1997 American Institute of Physics.