N. Furukawa et al., EFFECTS OF INTRODUCTION OF SILOXANE SEGME NTS ON SINGLE LAP SHEAR-STRENGTH OF THERMOPLASTIC POLYIMIDES, Nippon kagaku kaishi, (5), 1998, pp. 310-319
In recent years, several kinds of adhesive films have been developed a
nd applied in aerospace and electronic industries. Processability at m
oderate conditions, high initial lap shear strength, durability under
high humidity and high temperature conditions are major requirement in
their applications. Recently, the polyimide adhesives have been also
applied in microelectronics and printed wiring boards industries in Ja
pan. However, they ought to be processed at high temperature (> 300 de
grees C) and pressure (> 20 MPa) due to the low fluidity. In this work
, the relationship between structure and single lap shear bond strengt
h of various polyimides were studied for developing the polyimides sui
ted as film-adhesives with good processability and adhesive strength.
It was found that the polyimides derived from 4,4'-carbonyl-diphthalic
anhydride (CDPA) and bis[4-(3-aminophenoxy)phenyl]sulfone (BAPSM) exh
ibit excellent lap shear strength at room temperature. In addition, va
rious kinds of polysiloxane-block-copolyimides were synthesized and ex
amined as film-adhesives to study the effects of polysiloxane incorpor
ation into aromatic polyimides on the initial lap shear strength. The
all of copolyimides containing 10 wt% of polysiloxane were found to ha
ve excellent lap shear strength, despite the difference in aromatic co
mponents. Their adhesive durability under a highly humid condition (25
degrees C, 90%RH) was also improved mainly due to their lower moistur
e sorption and lower moisture permeability. However, further incorpora
tion of polysiloxane into polymer backbone gradually lowered the initi
al lap shear strength and the durability.