S. Maeda et al., EVAPORATION OF OXYGEN-CONTAINING SPECIES FROM BORON-DOPED SILICON MELTS, Journal of the Electrochemical Society, 145(7), 1998, pp. 2548-2552
Citations number
14
Categorie Soggetti
Electrochemistry,"Materials Science, Coatings & Films
Weight variations in boron-doped silicon melts due to the evaporation
of oxygen-containing species from the free melt surface were measured
by using the thermogravimetric method. Compared to the results obtaine
d in the absence of doping, evaporation from boron-doped (10(21) cm(-3
)) silicon melts was much increased, and showed a strong pressure depe
ndence when the temperature of the melt was high (1550 degrees C). How
ever, a slight reduction of evaporation was observed for 1 X 10(18) at
om/cm(3) boron doping under a pressure of 1 atm when the temperature o
f the melt was low (1450C). Results of electron probe microanalysis of
deposits from boron-doped melts and dissolution rates of silica rods
being etched by silicon melts are also presented, and the influence of
boron addition on evaporation and the oxygen transport in the melts i
s discussed.