XAES AND XPS STUDY OF AMORPHOUS-CARBON NITRIDE LAYERS

Authors
ZEMEK J ZALMAN J LUCHES A
Citation
J. Zemek et al., XAES AND XPS STUDY OF AMORPHOUS-CARBON NITRIDE LAYERS, Applied surface science, 133(1-2), 1998, pp. 27-32
Citations number
29
Categorie Soggetti
Physics, Applied","Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
133
Issue
1-2
Year of publication
1998
Pages
27 - 32
Database
ISI
SICI code
0169-4332(1998)133:1-2<27:XAXSOA>2.0.ZU;2-1
Abstract
An attempt is made to apply a method of the C KVV Auger peak width, su ccessfully used for estimation of sp(2) sites of carbon atoms in a-C a nd a-C:H films, to amorphous hydrogen-free carbon nitride layers expos ed to air. The C KVV line width is related to the surface composition determined by photoelectron spectroscopy. Results show that the width is strongly influenced by oxygen. An evident correlation between the w idth and oxygen atomic concentration at layer surfaces is found. (C) 1 998 Elsevier Science B.V. All rights reserved.