F. Kotter et A. Benninghoven, SECONDARY-ION EMISSION FROM POLYMER SURFACES UNDER AR-BOMBARDMENT(, XE+ AND SF5+ ION), Applied surface science, 133(1-2), 1998, pp. 47-57
Citations number
4
Categorie Soggetti
Physics, Applied","Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
We investigated the characteristic molecular secondary ion emission fr
om polymer surfaces under 10 keV Ar+, Xe+ and SF5+ bombardment. Second
ary ion yields of PET, PP, PTFE, PS, PC, PMMA and PEG were determined
under static SIMS conditions. Damage cross sections were measured for
PS and PC. We applied a time-of-flight mass spectrometer, equipped wit
h a pulsed EI-source allowing the application of mass separated primar
y ion beams. Spin coated multilayers as well as surfaces of bulk polym
ers have been studied. Changing from Ar+ to Xe+ and to SF5+ bombardmen
t we found a strong increase of the yield Y (up to a factor of 1000) a
nd a much smaller increase in the corresponding damage cross sections
sigma (up to a factor of 6) for characteristic molecular secondary ion
s. Both effects are more pronounced in the high mass range. The corres
ponding increases in secondary ion formation efficiencies ranges betwe
en a factor of 5 and 50, depending on the polymer species, the sample
preparation and the mass range. Preliminary results for monomolecular
overlayers on Ag and Si indicate a similar behaviour of their characte
ristic secondary ion emission. (C) 1998 Elsevier Science B.V. All righ
ts reserved.