ELECTROLUMINESCENT SIO2 SI SUPERLATTICES PREPARED BY LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION/

SiO2/Si superlattices were fabricated by low pressure chemical vapour deposition. Superlattices of 1-6 nm in layer thickness and having 1-60 layer pairs were investigated in order to evaluate their surface stru cture and electroluminescent properties. The atomic force microscope ( AFM) studies are presented for investigation of surface morphology, an d the transmission electron microscope (TEM) analysis for revealing la yer structure. The current-voltage characteristics and the electrolumi nescence spectrum are also shown. The experimental results show that t he superlattices prepared by chemical vapour deposition can emit visib le light when the forward bias voltage exceeded 6 V. (C) 1998 Elsevier Science B.V. All rights reserved.