Rm. Hagenmayer et al., STRUCTURAL STUDIES ON AMORPHOUS SI2O3 AND H2SI2O4 BY MEANS OF DIFFRACTION USING HIGH-ENERGY PHOTONS, Journal of non-crystalline solids, 226(3), 1998, pp. 225-231
The structures of amorphous Si2O3 and H2Si2O4 have been investigated u
sing X-ray diffraction with synchrotron radiation at 80 and 120 keV. C
onsidering the geometrical limits of the used diffractometer this lead
s to the range of momentum transfer from 0.8 to 29 Angstrom(-1). The s
tructure factors and the pair correlation functions show that the curv
es are more damped for the silicon sesquioxide Si2O3 From the pair cor
relation functions of both substances, we retrieve a nearest neighbour
distance of about 1.6 Angstrom as is typical for a Si-O bond for tetr
ahedrally coordinated silicon and of about 2.3 Angstrom that can be re
lated to a direct Si-Si coordination. (C) 1998 Elsevier Science B.V. A
ll rights reserved.