ATOMIC-FORCE MICROSCOPE INVESTIGATION OF THE THERMAL-STABILITY OF THIN TISI2 FILMS

The thermal stability of TiSi2 films on Si has been studied using the atomic force microscope (AFM). Changes in the surface roughness, film morphology, and sheet resistance were monitored during a series of rap id thermal annealing treatments. A Linear increase of the root-mean-sq uare (rms) roughness with time was observed during the early stages of degradation, in agreement with a surface diffusion model of thermal g rooving, followed by an apparent saturation roughness that was attribu ted to the effective rupture of the film.