DOPING PROFILES FOR INDIUM-ANTIMONIDE MAGNETORESISTORS

Citation
Dl. Partin et al., DOPING PROFILES FOR INDIUM-ANTIMONIDE MAGNETORESISTORS, Sensors and actuators. A, Physical, 69(1), 1998, pp. 39-45
Citations number
8
Categorie Soggetti
Engineering, Eletrical & Electronic","Instument & Instrumentation
ISSN journal
09244247
Volume
69
Issue
1
Year of publication
1998
Pages
39 - 45
Database
ISI
SICI code
0924-4247(1998)69:1<39:DPFIM>2.0.ZU;2-A
Abstract
Indium antimonide is of interest for magnetoresistors in position- and speed-sensing applications. These sensors are fabricated as thin-film elements in order to increase the device impedance. The InSb is norma lly doped n-type to stabilize the electron density and hence the imped ance with respect to temperature changes. This involves tradeoffs, sin ce ionized donors also scatter electrons, reducing their mobility and hence reducing the device sensitivity to a magnetic field. Therefore, optimizing the sensitivity of these devices involves optimizing the do ping of the InSb. This optimization involves three steps. The InSb is undoped for the first 10-20% of the film, forming a buffer from the la ttice-mismatched substrate. The middle, active, layer of the film has a doping gradient. Finally, a thin contact layer is more heavily doped to reduce parasitic contact resistance. (C) 1998 Elsevier Science S.A . All rights reserved.