ALCOHOL-ASSISTED GROWTH OF COPPER CVD FILMS

Citation
Ns. Borgharkar et al., ALCOHOL-ASSISTED GROWTH OF COPPER CVD FILMS, Thin solid films, 320(1), 1998, pp. 86-94
Citations number
19
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
320
Issue
1
Year of publication
1998
Pages
86 - 94
Database
ISI
SICI code
0040-6090(1998)320:1<86:AGOCCF>2.0.ZU;2-S
Abstract
We report the effect of various alcohols on the transport mechanism an d reaction kinetics of Cu(hfac)(2) reduction for copper CVD. A variety of transport experiments are performed, all of which indicate that th e presence of alcohol does nothing to increase the vapor phase transpo rt rate of Cu(hfac)(2). In contrast, steady-state kinetic measurements reveal a significant increase in CVD growth rates upon addition of an alcohol co-reactant, which we therefore attribute to an alcohol-assis ted enhancement of the intrinsic kinetics of Cu(hfac)(2) reduction. Fo r the series of alcohols studied, the enhancement factor increases in the order: MeOH < EtOH < i-PrOH; this correlates with the pK(a) values of the alcohols. The dependence of the growth rate on alcohol partial pressure is first-order, which can be described using a simple modifi cation of our earlier Langmuir-Hinshelwood rate expression for H-2 red uction of Cu(hfac)(2). The revised expression is consistent with a mec hanism in which the rate limiting step involves H+ transfer between an adsorbed alcohol molecule and the first dissociated (hfac) ligand fro m an adsorbed Cu(hfac)(2) molecule. (C) 1998 Elsevier Science S.A. All rights reserved.