FABRICATION OF A GRAY-TONE MASK AND PATTERN TRANSFER IN THICK PHOTORESISTS

Authors
NICOLAS S DUFOURGERGAM E BOSSEBOEUF A BOUROUINA T GILLES JP GRANDCHAMP JP
Citation
S. Nicolas et al., FABRICATION OF A GRAY-TONE MASK AND PATTERN TRANSFER IN THICK PHOTORESISTS, Journal of micromechanics and microengineering, 8(2), 1998, pp. 95-98
Citations number
12
Categorie Soggetti
Engineering, Eletrical & Electronic","Engineering, Mechanical","Instument & Instrumentation
Journal title
Journal of micromechanics and microengineering → ACNP
ISSN journal
09601317
Volume
8
Issue
2
Year of publication
1998
Pages
95 - 98
Database
ISI
SICI code
0960-1317(1998)8:2<95:FOAGMA>2.0.ZU;2-P
Abstract
A low-cost gray-tone mask fabrication for thick resist UV lithography is described. The experimental relation between the theoretical transm ission and the remaining resist thickness after development is present ed.