AUTOMATIC MASK ADAPTATION OF CMOS-COMPATIBLE MICROMACHINED DEVICES USING THEIR FINITE-ELEMENT MODEL

This paper reports on an extension of a FEM-to-layout converter which gives the designer of microsystems the opportunity to adapt existing m icrosystems on the structural level towards personal requirements. Thi s tool enables the designer to change the properties of such microsyst ems on the level of a finite element model. After the accomplishment o f the changes, the corresponding masks of these devices are adapted au tomatically on the layout level, so that it is not necessary for the d esigner to have knowledge of the specific layers which are necessary t o fabricate these devices and, therefore, have to be adapted.