M. Lang et M. Glesner, AUTOMATIC MASK ADAPTATION OF CMOS-COMPATIBLE MICROMACHINED DEVICES USING THEIR FINITE-ELEMENT MODEL, Journal of micromechanics and microengineering, 8(2), 1998, pp. 165-167
This paper reports on an extension of a FEM-to-layout converter which
gives the designer of microsystems the opportunity to adapt existing m
icrosystems on the structural level towards personal requirements. Thi
s tool enables the designer to change the properties of such microsyst
ems on the level of a finite element model. After the accomplishment o
f the changes, the corresponding masks of these devices are adapted au
tomatically on the layout level, so that it is not necessary for the d
esigner to have knowledge of the specific layers which are necessary t
o fabricate these devices and, therefore, have to be adapted.