Thin plasma polymer films with embedded silver particles were deposite
d by simultaneous plasma polymerization and metal evaporation as multi
layer systems. The multilayer consists of a first plasma polymer layer
, a plasma polymer metal composite layer and a second plasma polymer l
ayer, and the silver particles are embedded completely. During anneali
ng in situ in the electron microscope, large, nearly spherical silver
particles were formed. These recrystallization is a result of atomic d
iffusion along the particle surface and along the grain boundaries. At
a multilayer system with well-separated silver particles, very small
particles (d less than or equal to 10 nm) disappear during annealing,
but no significant changes of the size and shape of larger (20 less th
an or equal to d less than or equal to 60 nm) particles were found. Th
is was interpreted as a result of atomic diffusion of silver through t
he polymer matrix (Ostwald ripening). (C) 1998 Elsevier Science S.A.