FORMATION AND EVALUATION OF CEN THIN-FILMS

Authors
Citation
Sq. Xiao et O. Takai, FORMATION AND EVALUATION OF CEN THIN-FILMS, Thin solid films, 317(1-2), 1998, pp. 137-139
Citations number
9
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
317
Issue
1-2
Year of publication
1998
Pages
137 - 139
Database
ISI
SICI code
0040-6090(1998)317:1-2<137:FAEOCT>2.0.ZU;2-T
Abstract
CeNx films are prepared by rf ion plating and analyzed by X-ray photoe lectron spectroscopy (XPS). Ar/N-2 flow ratios are varied and Ar gas i s found to play a very important role in the formation of the stoichio metric CeN film. The shake-up satellite peaks from 4f degrees initial state in the Ce 3d core level vanishes when stoichiometric CeN is form ed. The CeN film shows p-type conduction and the room temperature resi stivity is 2.1 x 10(2) Omega cm. The optical band gap is 1.76 eV with direct transition, which agrees well with the prediction of Sclar [N. Sclar, J. Appl. Phys. 33 (1962) 2999]. (C) 1998 Elsevier Science S.A.