CHARACTERIZATION OF INDIUM-TIN OXIDE-FILMS BY MEANS OF ION-IMPLANTED NUCLEAR PROBES

Citation
H. Metzner et al., CHARACTERIZATION OF INDIUM-TIN OXIDE-FILMS BY MEANS OF ION-IMPLANTED NUCLEAR PROBES, Thin solid films, 317(1-2), 1998, pp. 161-164
Citations number
8
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
317
Issue
1-2
Year of publication
1998
Pages
161 - 164
Database
ISI
SICI code
0040-6090(1998)317:1-2<161:COIOBM>2.0.ZU;2-5
Abstract
Indium-tin oxide films of different tin content(0.0, 1.0, and 10 met. at.%) have been prepared on unheated glass substrates by means of elec tron beam evaporation under oxygen partial pressures of typically 5 x 10(-4) hPa, annealed at 250 degrees C, and characterized optically and electrically. Samples of these films have been implanted with radioac tive In-111 probes at an energy of 400 keV. Subsequently, gamma gamma perturbed angular correlations were observed during the decay of In-11 1 to Cd-111. We detect the electric quadrupole interactions which are characteristic of the nuclear tracers on substitutional cation sites i n the bixbyite structure of In2O3. Sn atoms and intrinsic defects indu ce a damping of the respective hyperfine modulations. The results are compared to our previous investigation of Sn-doped In2O3 bulk samples and possible applications are discussed. (C) 1998 Elsevier Science S.A .