SEGREGATION OF ALLOYING ELEMENTS IN PASSIVE SYSTEMS - I - XPS STUDIESON THE NI-W SYSTEM

Authors
ZHANG L MACDONALD DD
Citation
L. Zhang et Dd. Macdonald, SEGREGATION OF ALLOYING ELEMENTS IN PASSIVE SYSTEMS - I - XPS STUDIESON THE NI-W SYSTEM, Electrochimica acta, 43(18), 1998, pp. 2661-2671
Citations number
35
Categorie Soggetti
Electrochemistry
Journal title
Electrochimica acta → ACNP
ISSN journal
00134686
Volume
43
Issue
18
Year of publication
1998
Pages
2661 - 2671
Database
ISI
SICI code
0013-4686(1998)43:18<2661:SOAEIP>2.0.ZU;2-Z
Abstract
A method has been developed for analyzing XPS depth profiles to quanti fy the segregation of alloying elements in passive systems, for determ ining the relative extents of selective dissolution and selective oxid ation of the alloying elements, and for understanding the mechanisms i nvolved. A sputter kinetic model is proposed to correct depth profiles when preferential sputtering occurs. Analysis of XPS depth profiles f or a passivated Ni-W (5.86%) alloy has been performed to illustrate th e method. (C) 1998 Elsevier Science Ltd. All rights reserved.