M. Neubauer et al., ION-BEAM-INDUCED MAGNETIC ANISOTROPIES IN IRON FILMS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 139(1-4), 1998, pp. 332-337
100-300 nm thin Fe layers evaporated onto crystalline and amorphous Si
or SiO2 substrates were irradiated, at 77 K, with 10(14)-10(16) Xe+-i
ons/cm(2) at 450 keV beam energy. The magnetizations in the films were
measured by means of Perturbed Angular Correlation (PAC) spectroscopy
with implanted In-111 tracer ions, or the Magneto-Optic Kerr Effect (
MOKE). Upon ion implantation, dramatic changes of the magnetic anisotr
opy were observed which are attributed to ion-beam enhanced lateral gr
ain growth. Very little influence of the deposition parameters (type a
nd cristallinity of substrate, evaporation rate) on the anisotropic ma
gnetization was found. (C) 1998 Elsevier Science B.V.