ION-BEAM-INDUCED MAGNETIC ANISOTROPIES IN IRON FILMS

Citation
M. Neubauer et al., ION-BEAM-INDUCED MAGNETIC ANISOTROPIES IN IRON FILMS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 139(1-4), 1998, pp. 332-337
Citations number
21
Categorie Soggetti
Instument & Instrumentation","Nuclear Sciences & Tecnology","Physics, Atomic, Molecular & Chemical","Physics, Nuclear
ISSN journal
0168583X
Volume
139
Issue
1-4
Year of publication
1998
Pages
332 - 337
Database
ISI
SICI code
0168-583X(1998)139:1-4<332:IMAIIF>2.0.ZU;2-N
Abstract
100-300 nm thin Fe layers evaporated onto crystalline and amorphous Si or SiO2 substrates were irradiated, at 77 K, with 10(14)-10(16) Xe+-i ons/cm(2) at 450 keV beam energy. The magnetizations in the films were measured by means of Perturbed Angular Correlation (PAC) spectroscopy with implanted In-111 tracer ions, or the Magneto-Optic Kerr Effect ( MOKE). Upon ion implantation, dramatic changes of the magnetic anisotr opy were observed which are attributed to ion-beam enhanced lateral gr ain growth. Very little influence of the deposition parameters (type a nd cristallinity of substrate, evaporation rate) on the anisotropic ma gnetization was found. (C) 1998 Elsevier Science B.V.