INFLUENCE OF AN ELECTRICAL-FIELD ON OPTICAL-RECORDING IN CHALCO-HALIDE GLASSES

Citation
M. Mitkova et al., INFLUENCE OF AN ELECTRICAL-FIELD ON OPTICAL-RECORDING IN CHALCO-HALIDE GLASSES, Journal of non-crystalline solids, 230, 1998, pp. 748-751
Citations number
10
Categorie Soggetti
Material Science, Ceramics
ISSN journal
00223093
Volume
230
Year of publication
1998
Part
B
Pages
748 - 751
Database
ISI
SICI code
0022-3093(1998)230:<748:IOAEOO>2.0.ZU;2-E
Abstract
The present investigations concern holographic recording on thin films of the systems Se-Ag-I and Ge-Se-AgI. After optimization of compositi ons and intensity of the laser beam for recording on these films, expe riments are conducted on a three-layer structure-SnO2-chalco-halide-Au . Various bias voltages were applied on this structure in the process of optical recording. It is established that depending on the voltage bias the sensitivity of the layers can be increased. The mechanism of this process is discussed in terms of the occurrence of defects in the glassy film, as well as the processes in the heterojunction SnO2-chal co-halide film under different electric field polarities. (C) 1998 Els evier Science B.V. All rights reserved.