THE TEMPERATURE-DEPENDENCE OF THE TIME-AVERAGED DRIFT MOBILITY IN AS2S3 GLASS DERIVED FROM PA MEASUREMENTS

Citation
Am. Andriesh et al., THE TEMPERATURE-DEPENDENCE OF THE TIME-AVERAGED DRIFT MOBILITY IN AS2S3 GLASS DERIVED FROM PA MEASUREMENTS, Journal of non-crystalline solids, 230, 1998, pp. 820-823
Citations number
8
Categorie Soggetti
Material Science, Ceramics
ISSN journal
00223093
Volume
230
Year of publication
1998
Part
B
Pages
820 - 823
Database
ISI
SICI code
0022-3093(1998)230:<820:TTOTTD>2.0.ZU;2-7
Abstract
The temperature dependence of the bimolecular recombination rate coeff icient (b) and the time-averaged drift mobility in As2S3 glass was stu died in the range 77-330 K on the basis of steady-state photoinduced a bsorption (PA) measurements. PA measurements have been carried out on glass samples in the form of optical fibres. The steady-state PA coeff icient varies approximately as the square root of the excitation Light intensity, indicating a bimolecular mechanism for the recombination o f excess carriers. In most disordered semiconductors carrier transport is diffusion-limited and taking into account that for chalcogenide gl asses the electron drift mobility mu(p), << mu(p) the hole drift mobil ity, the latter was derived from mu(p) = (EE0/e)b. The time-averaged m obility, mu(p), was found to be thermally activated at the higher temp eratures with activation energy similar to 0.9 eV, and with mu(p) simi lar to 10(-10) cm(2)/Vs at 300 K, but almost temperature independent b elow approximately 130 K. (C) 1998 Elsevier Science B.V. All rights re served.