R. Bruggemann et al., ELECTRONIC AND OPTICAL-PROPERTIES OF HOT-WIRE-DEPOSITED MICROCRYSTALLINE SILICON, Journal of non-crystalline solids, 230, 1998, pp. 982-986
We conducted a study on undoped and doped hydrogenated microcrystallin
e silicon (mu c-Si) samples deposited by hot-wire chemical vapor depos
ition for determination of the structural, electronic and optical prop
erties. Light scattering, investigated by total and specular transmiss
ion and reflection, as well as angular resolved measurements, results
mainly from the surface but with an intrinsic contribution from the in
terior. The optical properties resemble that of monocrystalline Si: th
e refractive index in the visible, the reflectance peaks in the near u
ltraviolet which may only appear after surface polishing, and the abso
rption coefficient which is larger than in monocrystalline silicon and
varies with sample thicknesses. Depending on the doping level, the da
rk conductivity prefactor and activation energy exhibit either normal
or anti-Meyer-Neldel rule behavior. The mobility-lifetime product from
steady state photoconductivity strongly depends on the position of th
e Fermi energy with a minimum for low p-type doping, suggesting the im
portance of information on the Fermi energy if the mobility-lifetime p
roduct is given as an indicator for material quality of microcrystalli
ne Si. (C) 1998 Elsevier Science B.V. All rights reserved.