MICROCRYSTALLINE THIN METAL-OXIDE FILMS FOR OPTOELECTRONIC APPLICATIONS

Citation
A. Malik et al., MICROCRYSTALLINE THIN METAL-OXIDE FILMS FOR OPTOELECTRONIC APPLICATIONS, Journal of non-crystalline solids, 230, 1998, pp. 1092-1095
Citations number
11
Categorie Soggetti
Material Science, Ceramics
ISSN journal
00223093
Volume
230
Year of publication
1998
Part
B
Pages
1092 - 1095
Database
ISI
SICI code
0022-3093(1998)230:<1092:MTMFFO>2.0.ZU;2-G
Abstract
We report the properties and optoelectronic applications of transparen t and conductive indium and tin oxide films prepared by the spray pyro lysis method and doped with Sn or F, respectively. The film properties have been measured using X-ray diffraction, optical and electrical ab sorption. As examples of applications we produced a set of selective o ptical detectors for different spectral regions, covering the waveleng th range from 0.25 to 1.1 mu m, based on metal oxide-semiconductor het erostructures and using different substrates such as: GaP, GaSe, AlxGa 1-xAs, GaAs and Si. The fabricated devices exhibit several features su ch as: production simplicity, high quantum efficiency, uniform sensiti vity over the entire active area and a high response speed. Finally, w e present a high quantum efficiency and solar blind monocrystalline zi nc sulphide optical sensor fabricated by spray deposition as an altern ative to the ultraviolet-enhanced SiC and GaN photodetectors and the p erformances of a solar cell. (C) 1998 Elsevier Science B.V. All rights reserved.