R. Bruggemann et C. Main, FERMI-LEVEL EFFECT ON STEADY-STATE AND TRANSIENT PHOTOCONDUCTIVITY INMICROCRYSTALLINE SILICON, Physical review. B, Condensed matter, 57(24), 1998, pp. 15080-15083
We show that steady-state and transient photoconductivity in microcrys
talline silicon deposited by hot-wire chemical-vapor deposition depend
strongly on the position of the Fermi level. The steady-state mobilit
y-lifetime product increases significantly by shifting the Fermi level
from around midgap towards the conduction or valence band. This incre
ase corresponds to a slower decay in the transient photocurrent after
pulsed excitation compared to the case with the Fermi level at midgap.
We thus attribute the enhancement of the mobility-lifetime product to
the increase of the lifetime of the majority carriers due to a change
in the thermal occupation of defect centers by the shift in the Fermi
level. The mobility-lifetime product information, often used as an in
dicator for material quality, should be complemented by the value of t
he dark conductivity, which monitors the Fermi level, in order to allo
w comparison between different samples. From our transient photorespon
se data we deduce a ratio of 10:1 for the mobility of electrons to the
mobility of holes.