X-RAY PHOTOELECTRON-SPECTRA OF ADHESION-ENHANCED A-SI-H ON STAINLESS-STEEL INDUCED BY PLASMA TREATMENTS

Authors
LAROCQUE AGD BERTRAND N BONNEFONT PA BULKIN P DREVILLON B SENEMAUD C
Citation
Agd. Larocque et al., X-RAY PHOTOELECTRON-SPECTRA OF ADHESION-ENHANCED A-SI-H ON STAINLESS-STEEL INDUCED BY PLASMA TREATMENTS, Journal of non-crystalline solids, 230, 1998, pp. 59-62
Citations number
4
Categorie Soggetti
Material Science, Ceramics
Journal title
Journal of non-crystalline solids → ACNP
ISSN journal
00223093
Volume
230
Year of publication
1998
Part
A
Pages
59 - 62
Database
ISI
SICI code
0022-3093(1998)230:<59:XPOAAO>2.0.ZU;2-6
Abstract
An investigation by X-ray photoelectron spectroscopy (XPS) of adhesion mechanisms of a-Si:H films on stainless steel substrates after hydrog en (H-2), nitrogen (N-2) and ammonia (NH3) plasma treatments of the su rface is presented. It is shown that adhesion is increased by N-2 trea tment. This effect is related to chemical bonding states at the interf ace. The improvement is attributed to the formation of silicon nitride at the interface and to the existence of Fe-Fe metallic bonds which c ontribute to a hardening of the substrate. (C) 1998 Elsevier Science B .V. All rights reserved.