RELATION BETWEEN PHOTOCREATED AND THERMALLY-QUENCHED DEFECTS IN A-SI-H

Citation
T. Shimizu et al., RELATION BETWEEN PHOTOCREATED AND THERMALLY-QUENCHED DEFECTS IN A-SI-H, Journal of non-crystalline solids, 230, 1998, pp. 292-295
Citations number
13
Categorie Soggetti
Material Science, Ceramics
ISSN journal
00223093
Volume
230
Year of publication
1998
Part
A
Pages
292 - 295
Database
ISI
SICI code
0022-3093(1998)230:<292:RBPATD>2.0.ZU;2-S
Abstract
It was found that light-soaked and thermally-quenched a-Si:H films wit h the same density of neutral dangling bonds, D-0 (3 X 10(16) cm(-3) i ncluding the surface defects) have different light-induced ESR spectra and different dark- and photoconductivities. We carried out the light -soaking for these two films and found that the D-0-creation rate for the thermally-quenched film is larger than that for the light-soaked f ilm. From these results, we conclude that the Si-Si weak bond plays a role of the photocreation of D-0. (C) 1998 Elsevier Science B.V. All r ights reserved.