FABRICATION OF CONDUCTIVE WIRES BY ELECTRON-BEAM-INDUCED DEPOSITION

Conductive wires are fabricated by electron-beam-induced deposition. I n fabrication, the deposition property of the beam-induced process has been demonstrated using rate equations describing precursor molecule supply and consumption by electron irradiation. Repeated electron beam line scanning is thought to be more effective in wire fabrication tha n single slow scanning. Conditions arise, however, where the result is other than anticipated. Results are explained by the secondary electr ons emitted by the primary electron beam considering the angle depende nce of the secondary electron yield.