Quantum well states are observed in Cu films grown on magnetic fcc-Co(
100), using high-resolution photoemission. fcc-Co(100) films were obta
ined by room temperature epitaxy on a Cu(100) substrate. Cu films of d
ifferent thickness were grown stepwise on top of the fcc-Co(100) layer
following two different preparation methods. In the first one, the fi
rst deposition step was performed at 100 K, while the rest of the depo
sition took place at room temperature. In the second method, the whole
process was carried out at room temperature. The initial deposition a
t low temperature produced an abrupt, non-reacted Cu-Co interface, whe
reas the Co/Cu interface obtained in the second case was of less quali
ty. High-quality quantum well states were observed only in the low-tem
perature deposition case, revealing the importance of an abrupt interf
ace in the confinement of the quantum well states. (C) 1998 Elsevier S
cience B.V. All rights reserved.