HEXADECAFLUORO-COPPER-PHTHALOCYANINE UHV DEPOSITED ONTO SI(111)7X7 SUBSTRATE - AN XPS STUDY

Citation
L. Ottaviano et al., HEXADECAFLUORO-COPPER-PHTHALOCYANINE UHV DEPOSITED ONTO SI(111)7X7 SUBSTRATE - AN XPS STUDY, Surface science, 404(1-3), 1998, pp. 518-522
Citations number
10
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
404
Issue
1-3
Year of publication
1998
Pages
518 - 522
Database
ISI
SICI code
0039-6028(1998)404:1-3<518:HUDOSS>2.0.ZU;2-B
Abstract
We have deposited, in ultra-high vacuum conditions, hexadecafluoro cop per phthalocyanine on to clean Si(111) 7 x 7 substrate and studied the organic-inorganic interface by means of monochromatic X-ray photoemis sion spectroscopy. The measurements, performed at various organic film thicknesses, show a strong interaction between the molecule and the s ilicon substrate. The presence of the 16 fluorine atoms at the outer s tructure of the planar molecule allows an easy detection of the chemis orption effects on the substrate. The results suggest the growth of a planar ultra-thin film of molecules on to the silicon surface. (C) 199 8 Elsevier Science B.V. All rights reserved.