J. Rosa et al., SIMULTANEOUS CHARACTERIZATION OF DEFECT STATES IN CVD DIAMOND BY PDS,EPR, RAMAN AND PHOTOCURRENT SPECTROSCOPIES, DIAMOND AND RELATED MATERIALS, 7(7), 1998, pp. 1048-1053
The assessment of the quality of CVD diamond films, a very important i
ssue for the preparation of electronics-quality material, has been app
roached with the help of Raman, luminescence and photocurrent spectros
copy, photothermal deflection spectroscopy (PDS) and electron paramagn
etic resonance (EPR). In heteroepitaxial diamond films deposited on si
licon wafers by plasma-enhanced chemical vapour deposition (PECVD) we
have observed the following defects: sp(2) bonded carbon, carbon dangl
ing bonds, nitrogen and silicon. Raman scattering is sensitive to sp(2
) bonded carbon, PDS sees total absorption due to sp(2) bonded carbon,
dangling bonds and nitrogen. Typically, the graphitic inclusions betw
een the grains dominate the PDS spectrum. EPR detects carbon dangling
bonds (vacancy-like defect, with possible H involvement) with g = 2.00
28 and paramagnetic form of nitrogen with g = 2.0024. A strong photolu
minescence peak at 1.68 eV reflects the Si contamination, Nitrogen-rel
ated transitions were detected by photocurrent measurement, with a cha
racteristic threshold at about 2.1 eV, and seen in luminescence. A thr
eshold energy of approximately 1 eV was attributed to the carbon dangl
ing bond defect, which was observed also by EPR. This g = 2.0028 signa
l decreases with an increase in material quality, as determined by Ram
an spectra. (C) 1998 Elsevier Science S.A.