Zh. Liu et al., CHARACTERIZATION OF ULTRA-THIN DLC COATINGS BY SEM EDX, AFM AND ELECTROCHEMICAL TECHNIQUES/, DIAMOND AND RELATED MATERIALS, 7(7), 1998, pp. 1059-1065
Characterisation of DLC coatings ion beam-deposited on to AlTiC substr
ate (70 wt% Al2O3 + 30 wt% TiC) has been carried out. AFM and SEM anal
ysis showed that the island-like topography of DLC-coated AlTiC substr
ates is very similar to that of uncoated substrate, implying the full
coverage of coatings without visible defects. Moreover, the island hei
ght was found to increase on average either with film thickness or dep
osition voltage due to the possible preferential growth of DLC on TiC
and the possible preferential sputter etching of Al2O3 by energetic io
ns at the initial film growth stage when deposited at increased voltag
es. Electrochemical measurements showed that coating with relatively t
hick DLC films (> 100 nm) at an ion beam deposition voltage of 200 V c
an enhance significantly the impedance of sample/solution interface so
as to increase the corrosion potential of the substrate. For a given
film thickness, however, the impedance as well as the corrosion potent
ial increase with deposition voltage up to 200 V and decrease thereaft
er. This is attributed mainly to the kinetic energy-dependent microstr
ucture of both DLC and the coating/substrate interface. Consequently,
deposition of DLC under proper conditions can improve dramatically the
corrosion resistance of AlTiC when used in a corrosive environment. (
C) 1998 Elsevier Science S.A.