SIGE HETEROSTRUCTURES FOR FET APPLICATIONS

Citation
Te. Whall et Ehc. Parker, SIGE HETEROSTRUCTURES FOR FET APPLICATIONS, Journal of physics. D, Applied physics, 31(12), 1998, pp. 1397-1416
Citations number
92
Categorie Soggetti
Physics, Applied
ISSN journal
00223727
Volume
31
Issue
12
Year of publication
1998
Pages
1397 - 1416
Database
ISI
SICI code
0022-3727(1998)31:12<1397:SHFFA>2.0.ZU;2-F
Abstract
The high room-temperature carrier mobilities which have recently been observed for both electrons and holes in Si/SiGe heterostructures and the possibility of further improvements offer the prospect of silicon- based field effect transistors (FETs) with performances matching those of bipolar transistors and ill-V modulation-doped FETs. In this artic le the electrical properties of this semiconductor system and the asso ciated materials challenges are discussed, and some of the more import ant device applications are reviewed.