THERMOMECHANICAL STUDIES ON NEWLY DEVELOPED COPOLYESTER THIN-FILMS - PART II - THERMAL AND INTRINSIC STRESS

Authors
Citation
Ff. Shi et J. Economy, THERMOMECHANICAL STUDIES ON NEWLY DEVELOPED COPOLYESTER THIN-FILMS - PART II - THERMAL AND INTRINSIC STRESS, Polymer engineering and science, 38(6), 1998, pp. 971-975
Citations number
17
Categorie Soggetti
Polymer Sciences","Engineering, Chemical
ISSN journal
00323888
Volume
38
Issue
6
Year of publication
1998
Pages
971 - 975
Database
ISI
SICI code
0032-3888(1998)38:6<971:TSONDC>2.0.ZU;2-7
Abstract
Thermal stresses were determined by a wafer bending technique for a ne wly developed family of all-aromatic and aromatic/aliphatic copolyeste r thermosetting films prepared by spin coating. The intrinsic stresses of the films were also estimated for T > T-g (glass transition temper ature). The effects of chemical structure and film processing conditio ns on thermal stresses are discussed. Thermal stresses varied with tem perature and processing conditions, and the variations were dependent upon the chemical structures and T-g of the copolyester films. The T-g 's of different copolyesters were also estimated from thermal stress-t emperature curves.