Careful examination of the 1997 National Technology Roadmap for Semico
nductors (NTRS) specifications for critical dimension and overlay tole
rance reveals areas where the industry needs more detail and better de
finition of terminologies. This need is especially important consideri
ng that the time is at hand when the industry has to choose among the
potential successors to optical lithography and begin the process of c
omparative evaluations so the applicable lithography methods are avail
able for IC production in 2001.