Vac. Haanappel et Mf. Stroosnijder, THE EFFECT OF ION-IMPLANTATION ON THE OXIDATION BEHAVIOR OF TIAL-BASED INTERMETALLIC ALLOYS AT 900-DEGREES-C, Surface & coatings technology, 105(1-2), 1998, pp. 147-154
The effect of various elements added by ion implantation on the isothe
rmal (up to 150 h) and cyclic (up to 1500 h) oxidation behaviour of tw
o Nb-containing gamma-TiAl-based intermetallic alloys, i.e. Ti-48Al-2C
r-2Nb and Ti-48Al-2Cr-2Nb at 900 degrees C in air is discussed. During
the initial stage of exposure some differences were found between the
different implanted elements, i.e. Si: Nb, Ta and W. Upon longer expo
sure times a similar oxidation behaviour was found as for the non-impl
anted material, indicating that the effect of ion implantation is negl
igible after longer exposure times. Also for cyclic oxidation experime
nts, after longer exposure times no differences were found between the
non-implanted and the material implanted with various elements. A ste
ady state condition is reached with a net linear mass loss rate, due o
xidation, spallation, and re-growth of the oxide scale. The net linear
mass loss rate for Ti-48Al-2Mn-2Nb was higher than found for Ti-48Al-
2Cr-2Nb, indicative of a higher susceptibility for cracking and spalla
tion. (C) 1998 Elsevier Science S.A.