Very small sized Ge dots, coherently embedded in Si, are investigated
by structural and photoluminescence (PL) measurements. The Ge dot form
ation is induced by 0.2 monolayers (ML) of pre-deposited carbon. These
carbon induced germanium (CGe)dots can be as small as 10 nm in diamet
er and 1 nm in height and exhibit an area density of 1 x 10(11) cm(-2)
. Although grown at temperatures as low as 550 degrees C a single laye
r of CGe islands shows intense PL signal compared to conventionally gr
own Ge dots grown at high temperatures. To explain the observed PL spe
ctra we propose spatially indirect recombination of electrons confined
in an underlying strain compensated Si1-x-yCxGey wetting layer and he
avy holes confined in the upper Ge rich part of the island. (C) 1998 E
lsevier Science S.A. All rights reserved.